Wilfried Noell
Overview
Explore the profile of Wilfried Noell including associated specialties, affiliations and a list of published articles.
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Articles
14
Citations
15
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Recent Articles
1.
Beguelin J, Noell W, Scharf T, Voelkel R
Appl Opt
. 2020 May;
59(13):3910-3919.
PMID: 32400660
Tolerancing is an important step toward the fabrication of high-quality and cost-effective lens surfaces. It is critical for wafer-level optics, when up to tens of thousands microlenses are fabricated in...
2.
Beguelin J, Symeonidis M, Noell W, Voelkel R, Scharf T
Appl Opt
. 2020 May;
59(12):3601-3607.
PMID: 32400494
Accurate characterization of high numerical aperture aspheric microlenses currently is a nonstandard procedure that remains an open challenge. Here, we present and discuss a characterization method based on interferometric and...
3.
Vetter A, Yan C, Kirner R, Scharf T, Noell W, Voelkel R, et al.
Opt Express
. 2019 Nov;
27(22):32523-32535.
PMID: 31684463
In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established...
4.
Kirner R, Beguelin J, Eisner M, Noell W, Scharf T, Voelkel R
Opt Express
. 2019 Mar;
27(5):6249-6258.
PMID: 30876213
The uniformity of large microlens arrays in Fused Silica is governed by the production process. It comprises photolithographic patterning of a spin-coated layer of photoresist on a 200mm wafer with...
5.
Vetter A, Kirner R, Opalevs D, Scholz M, Leisching P, Scharf T, et al.
Opt Express
. 2018 Aug;
26(17):22218-22233.
PMID: 30130918
A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the...
6.
Kirner R, Vetter A, Opalevs D, Gilfert C, Scholz M, Leisching P, et al.
Opt Express
. 2018 Feb;
26(2):730-743.
PMID: 29401954
We present a mask-aligner lithographic system operated with a frequency-quadrupled continuous-wave diode laser emitting at 193 nm. For this purpose, a 772 nm diode laser is amplified by a tapered...
7.
Kim M, Scharf T, Muhlig S, Fruhnert M, Rockstuhl C, Bitterli R, et al.
Opt Express
. 2016 May;
24(7):6996-7005.
PMID: 27136993
We study experimentally and theoretically the electromagnetic field in amplitude and phase behind ball-lenses across a wide range of diameters, ranging from a millimeter scale down to a micrometer. Based...
8.
Canonica M, Zamkotsian F, Lanzoni P, Noell W, De Rooij N
Opt Express
. 2013 Oct;
21(19):22400-9.
PMID: 24104129
A micromirror array composed of 2048 silicon micromirrors measuring 200 × 100 μm² and tilting by 25° was developed as a reconfigurable slit mask for multi-object spectroscopy (MOS) in astronomy....
9.
Weber S, Bonacina L, Noell W, Kiselev D, Extermann J, Jutzi F, et al.
Rev Sci Instrum
. 2011 Aug;
82(7):075106.
PMID: 21806226
We present an in-detail description of the design, simulation, fabrication, and packaging of a linear micromirror array specifically designed for temporal pulse shaping of ultrashort laser pulses. The innovative features...
10.
Extermann J, Weber S, Kiselev D, Bonacina L, Lani S, Jutzi F, et al.
Opt Express
. 2011 Apr;
19(8):7580-6.
PMID: 21503066
We describe the performance of a reflective pulse-shaper based on a Micro-ElectroMechanical System (MEMS) linear mirror array. It represents a substantial upgrade of a preceding release [Opt. Lett. 35, 3102...