Raoul Kirner
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Explore the profile of Raoul Kirner including associated specialties, affiliations and a list of published articles.
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5
Citations
2
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Recent Articles
1.
Vetter A, Yan C, Kirner R, Scharf T, Noell W, Voelkel R, et al.
Opt Express
. 2019 Nov;
27(22):32523-32535.
PMID: 31684463
In proximity mask aligner photolithography, diffraction of light at the mask pattern is the predominant source for image shape distortions such as line end shortening and corner rounding. One established...
2.
Kirner R, Beguelin J, Eisner M, Noell W, Scharf T, Voelkel R
Opt Express
. 2019 Mar;
27(5):6249-6258.
PMID: 30876213
The uniformity of large microlens arrays in Fused Silica is governed by the production process. It comprises photolithographic patterning of a spin-coated layer of photoresist on a 200mm wafer with...
3.
Vetter A, Kirner R, Opalevs D, Scholz M, Leisching P, Scharf T, et al.
Opt Express
. 2018 Aug;
26(17):22218-22233.
PMID: 30130918
A continuous improvement of resolution in mask-aligner lithography is sought after to meet the requirements of an ever decreasing minimum feature size in back-end processes. For periodic structures, utilizing the...
4.
Kirner R, Vetter A, Opalevs D, Gilfert C, Scholz M, Leisching P, et al.
Opt Express
. 2018 Feb;
26(2):730-743.
PMID: 29401954
We present a mask-aligner lithographic system operated with a frequency-quadrupled continuous-wave diode laser emitting at 193 nm. For this purpose, a 772 nm diode laser is amplified by a tapered...
5.
Li D, Kelly D, Kirner R, Sheridan J
Appl Opt
. 2012 Feb;
51(4):A1-10.
PMID: 22307124
The statistical properties of speckles in paraxial optical systems depend on the system parameters. In particular, the speckle orientation and the lateral dependence (x and y) of the longitudinal speckle...