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Chin-Tsai Hsu

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Chen W, Lin H, Lin Z, Hsu C, Huang T
Nanotechnology . 2010 Sep; 21(43):435201. PMID: 20876976
Employing mix-and-match lithography of I-line stepper and e-beam direct writing, independent double-gated poly-Si nanowire thin film transistors with channel lengths ranging from 70 nm to 5 µm were fabricated and...