Modified Spatially Confined Strategy Enabled Mild Growth Kinetics for Facile Growth Management of Atomically-Thin Tungsten Disulfides

Overview

Journal Adv Sci (Weinh)

Specialty Biomedical Engineering

Date 2022 Nov 29

PMID 36446619

Authors

Qun Wang

Shi Wang

Jingyi Li

Yichen Gan

Mengtian Jin

Run Shi

Abbas Amini

Ning Wang

Chun Cheng

Affiliations

Soon will be listed here.

Abstract

Chemical vapor deposition (CVD) has been widely used to produce high quality 2D transitional metal dichalcogenides (2D TMDCs). However, violent evaporation and large diffusivity discrepancy of metal and chalcogen precursors at elevated temperatures often result in poor regulation on X:M molar ratio (M = Mo, W etc.; X = S, Se, and Te), and thus it is rather challenging to achieve the desired products of 2D TMDCs. Here, a modified spatially confined strategy (MSCS) is utilized to suppress the rising S vapor concentration between two aspectant substrates, upon which the lateral/vertical growth of 2D WS can be selectively regulated via proper S:W zones correspond to greatly broadened time/growth windows. An S:W-time (SW-T) growth diagram was thus proposed as a mapping guide for the general understanding of CVD growth of 2D WS and the design of growth routes for the desired 2D WS . Consequently, a comprehensive growth management of atomically thin WS is achieved, including the versatile controls of domain size, layer number, and lateral/vertical heterostructures (MoS -WS ). The lateral heterostructures show an enhanced hydrogen evolution reaction performance. This study advances the substantial understanding to the growth kinetics and provides an effective MSCS protocol for growth design and management of 2D TMDCs.

Citing Articles

Modified Spatially Confined Strategy Enabled Mild Growth Kinetics for Facile Growth Management of Atomically-Thin Tungsten Disulfides.

Wang Q, Wang S, Li J, Gan Y, Jin M, Shi R Adv Sci (Weinh). 2022; 10(3):e2205638.

PMID: 36446619 PMC: 9875684. DOI: 10.1002/advs.202205638.

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