Laser Thinning and Patterning of MoS with Layer-by-Layer Precision

Overview

Journal Sci Rep

Specialty Science

Date 2017 Nov 16

PMID 29138427

Citations 13

Authors

Lili Hu

Xinyan Shan

Yanling Wu

Jimin Zhao

Xinghua Lu

Affiliations

Soon will be listed here.

Abstract

The recently discovered novel properties of two dimensional materials largely rely on the layer-critical variation in their electronic structure and lattice symmetry. Achieving layer-by-layer precision patterning is thus crucial for junction fabrications and device engineering, which hitherto poses an unprecedented challenge. Here we demonstrate laser thinning and patterning with layer-by-layer precision in a two dimensional (2D) quantum material MoS. Monolayer, bilayer and trilayer of MoS films are produced with precise vertical and lateral control, which removes the extruding barrier for fabricating novel three dimensional (3D) devices composed of diverse layers and patterns. By tuning the laser fluence and exposure time we demonstrate producing MoS patterns with designed layer numbers. The underlying physics mechanism is identified to be temperature-dependent evaporation of the MoS lattice, verified by our measurements and calculations. Our investigation paves way for 3D device fabrication based on 2D layered quantum materials.

Citing Articles

Selective CW Laser Synthesis of MoS and Mixture of MoS and MoO from (NH)MoS Film.

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Laser irradiation induced structural transformation in layered transition metal trichalcogenide nanoflakes.

Zhang H, Tu X, Wu Z, Guo J, Fei L, Liao X iScience. 2023; 26(10):107895.

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Electron beam lithography for direct patterning of MoS on PDMS substrates.

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PMID: 35479206 PMC: 9033649. DOI: 10.1039/d1ra00885d.

SLM-processed MoS/MoS nanocomposite for energy conversion/storage applications.

Alinejadian N, Kazemi S, Odnevall I Sci Rep. 2022; 12(1):5030.

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In Situ Fabrication of Freestanding Single-Atom-Thick 2D Metal/Metallene and 2D Metal/ Metallene Oxide Membranes: Recent Developments.

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