Tae Wan Park
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Explore the profile of Tae Wan Park including associated specialties, affiliations and a list of published articles.
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12
Citations
47
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Recent Articles
1.
Kim Y, Kang E, Park T, Park W
Materials (Basel)
. 2024 Nov;
17(22).
PMID: 39597432
Nano-transfer printing (nTP) has emerged as an effective method for fabricating three-dimensional (3D) nanopatterns on both flat and non-planar substrates. However, most transfer-printed 3D patterns tend to exhibit non-discrete and/or...
2.
Park T, Kang Y, Kim Y, Park W
Nanomaterials (Basel)
. 2023 Aug;
13(16).
PMID: 37630919
High-resolution nanotransfer printing (nTP) technologies have attracted a tremendous amount of attention due to their excellent patternability, high productivity, and cost-effectiveness. However, there is still a need to develop low-cost...
3.
Park T, Kang Y, Kang E, Kim S, Kim Y, Park W
Nanomaterials (Basel)
. 2023 Aug;
13(16).
PMID: 37630912
Various lithography techniques have been widely used for the fabrication of next-generation device applications. Micro/nanoscale pattern structures formed by lithographic methods significantly improve the performance capabilities of the devices. Here,...
4.
Park T, Kang Y, Kang E, Jung H, Lee S, Hwang G, et al.
Adv Sci (Weinh)
. 2023 Aug;
10(29):e2303412.
PMID: 37607117
Nanotransfer printing (nTP) is one of the most promising nanopatterning methods given that it can be used to produce nano-to-micro patterns effectively with functionalities for electronic device applications. However, the...
5.
Park T, Kang Y, Byun M, Hong S, Ahn Y, Lee J, et al.
Nanoscale Adv
. 2022 Sep;
3(17):5083-5089.
PMID: 36132336
Directed self-assembly (DSA) of block copolymers (BCPs) has garnered much attention due to its excellent pattern resolution, simple process, and good compatibility with many other lithography methods for useful nanodevice...
6.
Park T, Park W
Small
. 2021 Nov;
17(50):e2105078.
PMID: 34796645
The phase change memory (PCM) is one of the key enabling memory technologies for next-generation non-volatile memory device applications due to its high writing speed, excellent endurance, long retention time,...
7.
Park T, Jung H, Park J, Ahn Y, Hong S, Lee J, et al.
Nanoscale
. 2021 Jun;
13(25):11161-11168.
PMID: 34136893
Nanotransfer printing (nTP) has attracted much attention due to its high pattern resolution, simple process, and low processing cost for useful nanofabrication. Here, we introduce a thermally assisted nTP (T-nTP)...
8.
Park W, Park T, Choi Y, Lee S, Ryu S, Liang X, et al.
ACS Nano
. 2021 Jun;
15(6):10464-10471.
PMID: 34115490
Nanoimprint lithography (NIL) is typically performed by filling up of molds by heated polymers or UV-curable liquid resists, inevitably requiring subsequent pattern-transfer processes. Although direct NIL techniques have been suggested...
9.
Park T, Kang Y, Lee S, No G, Park E, Park C, et al.
Materials (Basel)
. 2021 Apr;
14(7).
PMID: 33805043
Various high-performance anode and cathode materials, such as lithium carbonate, lithium titanate, cobalt oxides, silicon, graphite, germanium, and tin, have been widely investigated in an effort to enhance the energy...
10.
Park T, Byun M, Jung H, Lee G, Park J, Jang H, et al.
Sci Adv
. 2020 Aug;
6(31):eabb6462.
PMID: 32832691
Nanotransfer printing (nTP) has attracted considerable attention due to its good pattern resolution, process simplicity, and cost-effectiveness. However, the development of a large-area nTP process has been hampered by critical...