Hyo Seon Suh
Overview
Explore the profile of Hyo Seon Suh including associated specialties, affiliations and a list of published articles.
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14
Citations
81
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Recent Articles
1.
Kim J, Zhou C, Mane A, Suh H, Kim S, Shi B, et al.
ACS Nano
. 2022 Mar;
16(4):5384-5392.
PMID: 35357130
In-plane tungsten oxide nanostructures, including hexagonally patterned cylinders and holes in a matrix, were fabricated sequential infiltration synthesis (SIS) on self-assembled block copolymer templates. Using the tailored morphology and porosity...
2.
Li J, Rincon-Delgadillo P, Suh H, Mannaert G, Nealey P
ACS Appl Mater Interfaces
. 2021 May;
13(21):25357-25364.
PMID: 34004117
Directed self-assembly (DSA) of block copolymers (BCP) has attracted considerable interest from the semiconductor industry because it can achieve semiconductor-relevant structures with a relatively simple process and low cost. However,...
3.
Oh J, Shin M, Kim I, Suh H, Kim Y, Kim J, et al.
ACS Nano
. 2021 May;
15(5):8549-8558.
PMID: 33979144
Shear alignment of the block copolymer (BCP) thin film is one of the promising directed self-assembly (DSA) methodologies for the unidirectional alignment of sub-10 nm microdomains of BCPs for next-generation...
4.
Doise J, Koh J, Kim J, Zhu Q, Kinoshita N, Suh H, et al.
ACS Appl Mater Interfaces
. 2019 Nov;
11(51):48419-48427.
PMID: 31752485
Directed self-assembly (DSA) of high-χ block copolymer thin films is a promising approach for nanofabrication of features with length scale below 10 nm. Recent work has highlighted that kinetics are...
5.
Oh J, Suh H, Ko Y, Nah Y, Lee J, Yeom B, et al.
Nat Commun
. 2019 Jul;
10(1):2912.
PMID: 31266942
Sub-10 nm patterns prepared by directed self-assembly (DSA) of block copolymer (BCP) thin films offer a breakthrough method to overcome the limitations of photolithography. Perpendicular orientation of the BCP nanostructures...
6.
Moni P, Suh H, Dolejsi M, Kim D, Mohr A, Nealey P, et al.
Langmuir
. 2018 Mar;
34(15):4494-4502.
PMID: 29561155
Directed self-assembly (DSA) of block copolymer (BCP) thin films is a promising approach to enable next-generation patterning at increasingly smaller length scales. DSA utilizes interfacial wetting layers to force the...
7.
Kim J, Suh H, Zhou C, Mane A, Lee B, Kim S, et al.
Nanoscale
. 2018 Feb;
10(7):3469-3479.
PMID: 29404547
Tungsten oxide (WO) nanostructures with hexagonal in-plane arrangements were fabricated by sequential infiltration synthesis (SIS), using the selective interaction of gas phase precursors with functional groups in one domain of...
8.
Zhang Q, Matsuoka F, Suh H, Beaucage P, Xiong S, Smilgies D, et al.
ACS Nano
. 2017 Dec;
12(1):347-358.
PMID: 29236479
Three-dimensional (3D) mesoporous thin films with sub-100 nm periodic lattices are of increasing interest as templates for a number of nanotechnology applications, yet are hard to achieve with conventional top-down...
9.
Suh H, Kim D, Moni P, Xiong S, Ocola L, Zaluzec N, et al.
Nat Nanotechnol
. 2017 Mar;
12(6):575-581.
PMID: 28346456
Directed self-assembly (DSA) of the domain structure in block copolymer (BCP) thin films is a promising approach for sub-10-nm surface patterning. DSA requires the control of interfacial properties on both...
10.
Chang T, Xiong S, Jacobberger R, Mikael S, Suh H, Liu C, et al.
Sci Rep
. 2016 Aug;
6:31407.
PMID: 27528258
Directed self-assembly of block copolymers is a scalable method to fabricate well-ordered patterns over the wafer scale with feature sizes below the resolution of conventional lithography. Typically, lithographically-defined prepatterns with...