Atomic Layer Deposition of CeO Film with a Novel Heteroleptic Ce(III) Complex

Overview

Journal Molecules

Publisher MDPI

Specialty Biology

Date 2024 Jul 13

PMID 38998939

Authors

Wenyong Zhao

Hong Zhou

Jiahao Li

Yuchen Lu

Yuqiang Ding

Affiliations

Soon will be listed here.

Abstract

In this paper, four heteroleptic Ce(III) complexes, including Ce(thd)-phen (thd = 2,2,6,6-tetramethyl-3,5-heptanedione, phen = 1, 10-phenanthroline (), Ce(thd)-MEDA (MEDA = N-Methylethylenediamine (), Ce(thd)-MOMA (MOMA = N-(2-Methoxyethyl)methylamine (), and Ce(thd)-DMDE (DMDE = ,″-dimethyl ethanol amine (), were synthesized and characterized with H-NMR, elemental analysis, and X-ray single-crystal diffraction. The thermogravimetric analysis and vapor pressure results indicated that the complexing ability of a nitrogen-containing bidentate ligand with a cerium ion was stronger than that of a mixed oxygen-nitrogen-containing bidentate ligand. Complex was selected as an ALD precursor to deposit a CeO film on a SiO/Si (100) wafer. The self-limited deposition results demonstrated that complex was a potential ALD precursor.

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