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Advancements in Nanoparticle Deposition Techniques for Diverse Substrates: A Review

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Date 2023 Sep 28
PMID 37764615
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Abstract

Nanoparticle deposition on various substrates has gained significant attention due to the potential applications of nanoparticles in various fields. This review paper comprehensively analyzes different nanoparticle deposition techniques on ceramic, polymeric, and metallic substrates. The deposition techniques covered include electron gun evaporation, physical vapor deposition, plasma enriched chemical vapor deposition (PECVD), electrochemical deposition, chemical vapor deposition, electrophoretic deposition, laser metal deposition, and atomic layer deposition (ALD), thermophoretic deposition, supercritical deposition, spin coating, and dip coating. Additionally, the sustainability aspects of these deposition techniques are discussed, along with their potential applications in anti-icing, antibacterial power, and filtration systems. Finally, the review explores the importance of deposition purities in achieving optimal nanomaterial performance. This comprehensive review aims to provide valuable insights into state-of-the-art techniques and applications in the field of nanomaterial deposition.

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