Synthesis of High Surface Area-Group 13-Metal Oxides Via Atomic Layer Deposition on Mesoporous Silica

Overview

Journal Nanomaterials (Basel)

Date 2022 May 14

PMID 35564168

Authors

Robert Baumgarten

Piyush Ingale

Kristian Knemeyer

Raoul Naumann dAlnoncourt

Matthias Driess

Frank Rosowski

Affiliations

Soon will be listed here.

Abstract

The atomic layer deposition of gallium and indium oxide was investigated on mesoporous silica powder and compared to the related aluminum oxide process. The respective oxide (GaO, InO) was deposited using sequential dosing of trimethylgallium or trimethylindium and water at 150 °C. In-situ thermogravimetry provided direct insight into the growth rates and deposition behavior. The highly amorphous and well-dispersed nature of the oxides was shown by XRD and STEM EDX-mappings. N sorption analysis revealed that both ALD processes resulted in high specific surface areas while maintaining the pore structure. The stoichiometry of GaO and InO was suggested by thermogravimetry and confirmed by XPS. FTIR and solid-state NMR were conducted to investigate the ligand deposition behavior and thermogravimetric data helped estimate the layer thicknesses. Finally, this study provides a deeper understanding of ALD on powder substrates and enables the precise synthesis of high surface area metal oxides for catalytic applications.

Citing Articles

Nature of GaO Shells Grown on Silica by Atomic Layer Deposition.

Chen Z, Zimmerli N, Zubair M, Yakimov A, Bjorgvinsdottir S, Alaniva N Chem Mater. 2023; 35(18):7475-7490.

PMID: 37780414 PMC: 10536998. DOI: 10.1021/acs.chemmater.3c00923.

References

Yan H, He K, Samek I, Jing D, Nanda M, Stair P . Tandem InO-Pt/AlO catalyst for coupling of propane dehydrogenation to selective H combustion. Science. 2021; 371(6535):1257-1260. DOI: 10.1126/science.abd4441. View

Knemeyer K, Piernavieja Hermida M, Ingale P, Schmidt J, Krohnert J, Naumann dAlnoncourt R . Mechanistic studies of atomic layer deposition on oxidation catalysts - AlO and PO deposition. Phys Chem Chem Phys. 2020; 22(32):17999-18006. DOI: 10.1039/d0cp02572k. View

Qin M, Ma J, Ke W, Qin P, Lei H, Tao H . Perovskite Solar Cells Based on Low-Temperature Processed Indium Oxide Electron Selective Layers. ACS Appl Mater Interfaces. 2016; 8(13):8460-6. DOI: 10.1021/acsami.5b12849. View

Lopez T, Fernandez Gonzalez A, Del Reguero A, Matos M, Diaz-Garcia M, Badia-Laino R . Engineered silica nanoparticles as additives in lubricant oils. Sci Technol Adv Mater. 2016; 16(5):055005. PMC: 5070026. DOI: 10.1088/1468-6996/16/5/055005. View

ODonoghue R, Rechmann J, Aghaee M, Rogalla D, Becker H, Creatore M . Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition. Dalton Trans. 2017; 46(47):16551-16561. DOI: 10.1039/c7dt03427j. View

Wei Y, Liu C, Zhang Y, Qi C, Li H, Wang T . Modulation of electronic and optical properties by surface vacancies in low-dimensional β-GaO. Phys Chem Chem Phys. 2019; 21(27):14745-14752. DOI: 10.1039/c9cp02196e. View

Hoch L, Wood T, OBrien P, Liao K, Reyes L, Mims C . The Rational Design of a Single-Component Photocatalyst for Gas-Phase CO Reduction Using Both UV and Visible Light. Adv Sci (Weinh). 2016; 1(1):1400013. PMC: 5115262. DOI: 10.1002/advs.201400013. View

Ma Q, Zheng H, Shao Y, Zhu B, Liu W, Ding S . Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors. Nanoscale Res Lett. 2018; 13(1):4. PMC: 5760491. DOI: 10.1186/s11671-017-2414-0. View

Shih H, Chu F, Das A, Lee C, Chen M, Lin R . Atomic Layer Deposition of Gallium Oxide Films as Gate Dielectrics in AlGaN/GaN Metal-Oxide-Semiconductor High-Electron-Mobility Transistors. Nanoscale Res Lett. 2016; 11(1):235. PMC: 4851678. DOI: 10.1186/s11671-016-1448-z. View

10.

Mackus A, Weber M, Thissen N, Garcia-Alonso D, Vervuurt R, Assali S . Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation. Nanotechnology. 2015; 27(3):034001. DOI: 10.1088/0957-4484/27/3/034001. View

11.

Knemeyer K, Baumgarten R, Ingale P, Naumann dAlnoncourt R, Driess M, Rosowski F . Toolbox for atomic layer deposition process development on high surface area powders. Rev Sci Instrum. 2021; 92(2):025115. DOI: 10.1063/5.0037844. View

12.

Rafie Borujeny E, Sendetskyi O, Fleischauer M, Cadien K . Low Thermal Budget Heteroepitaxial Gallium Oxide Thin Films Enabled by Atomic Layer Deposition. ACS Appl Mater Interfaces. 2020; 12(39):44225-44237. DOI: 10.1021/acsami.0c08477. View

13.

Strempel V, Naumann dAlnoncourt R, Driess M, Rosowski F . Atomic layer deposition on porous powders with in situ gravimetric monitoring in a modular fixed bed reactor setup. Rev Sci Instrum. 2017; 88(7):074102. DOI: 10.1063/1.4992023. View

14.

Ingale P, Knemeyer K, Piernavieja Hermida M, Naumann dAlnoncourt R, Thomas A, Rosowski F . Atomic Layer Deposition of ZnO on Mesoporous Silica: Insights into Growth Behavior of ZnO via In-Situ Thermogravimetric Analysis. Nanomaterials (Basel). 2020; 10(5). PMC: 7279530. DOI: 10.3390/nano10050981. View

15.

Schindler P, Logar M, Provine J, Prinz F . Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition. Langmuir. 2015; 31(18):5057-62. DOI: 10.1021/acs.langmuir.5b00216. View

16.

Sun L, Li R, Zhan W, Yuan Y, Wang X, Han X . Double-shelled hollow rods assembled from nitrogen/sulfur-codoped carbon coated indium oxide nanoparticles as excellent photocatalysts. Nat Commun. 2019; 10(1):2270. PMC: 6531469. DOI: 10.1038/s41467-019-10302-0. View

17.

Sattler J, Ruiz-Martinez J, Santillan-Jimenez E, Weckhuysen B . Catalytic dehydrogenation of light alkanes on metals and metal oxides. Chem Rev. 2014; 114(20):10613-53. DOI: 10.1021/cr5002436. View

18.

Nayak A, Lee S, Sohn Y, Pradhan D . Biomolecule-assisted synthesis of In(OH)₃ nanocubes and In₂O₃ nanoparticles: photocatalytic degradation of organic contaminants and CO oxidation. Nanotechnology. 2015; 26(48):485601. DOI: 10.1088/0957-4484/26/48/485601. View

19.

George S . Atomic layer deposition: an overview. Chem Rev. 2009; 110(1):111-31. DOI: 10.1021/cr900056b. View

20.

Kim H, Jung E, Mun G, Agbenyeke R, Park B, Park J . Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application. ACS Appl Mater Interfaces. 2016; 8(40):26924-26931. DOI: 10.1021/acsami.6b07332. View