» Articles » PMID: 33922231

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Overview
Date 2021 Apr 30
PMID 33922231
Citations 7
Authors
Affiliations
Soon will be listed here.
Abstract

The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.

Citing Articles

Combined Swelling and Metal Infiltration: Advancing Block Copolymer Pattern Control for Nanopatterning Applications.

Mullen E, Alvarez-Fernandez A, Prochukhan N, Davo-Quinonero A, Bekarevich R, Gity F ACS Appl Nano Mater. 2025; 8(4):1829-1842.

PMID: 39911404 PMC: 11791884. DOI: 10.1021/acsanm.4c06197.


From Printed Devices to Vertically Stacked, 3D Flexible Hybrid Systems.

Liu F, Christou A, Dahiya A, Dahiya R Adv Mater. 2025; 37(10):e2411151.

PMID: 39888128 PMC: 11899526. DOI: 10.1002/adma.202411151.


Focused solar annealing for block copolymer fast self-assembly.

Hu X, Zhang R, Zhang X, Wu Z, Zhou J, Li W Heliyon. 2024; 10(2):e24016.

PMID: 38293481 PMC: 10825308. DOI: 10.1016/j.heliyon.2024.e24016.


Wavelength-Dependent Shaping of Azopolymer Micropillars for Three-Dimensional Structure Control.

Januariyasa I, Borbone F, Salvatore M, Oscurato S ACS Appl Mater Interfaces. 2023; 15(36):43183-43192.

PMID: 37646775 PMC: 10510105. DOI: 10.1021/acsami.3c09264.


Proof of Concept for Sustainable Manufacturing of Neural Electrode Array for In Vivo Recording.

Li S, Tseng H, Chen B, Lo Y, Shao H, Wu Y Biosensors (Basel). 2023; 13(2).

PMID: 36832046 PMC: 9953957. DOI: 10.3390/bios13020280.


References
1.
Liddle J, Bowser J, Ilic B, Luciani V . So, You Want to Have a Nanofab? Shared-Use Nanofabrication and Characterization Facilities: Cost-of-Ownership, Toolset, Utilization, and Lessons Learned. J Res Natl Inst Stand Technol. 2022; 125:125009. PMC: 9017145. DOI: 10.6028/jres.125.009. View

2.
Gotrik K, Hannon A, Son J, Keller B, Alexander-Katz A, Ross C . Morphology control in block copolymer films using mixed solvent vapors. ACS Nano. 2012; 6(9):8052-9. DOI: 10.1021/nn302641z. View

3.
Cummins C, Gangnaik A, Kelly R, Borah D, OConnell J, Petkov N . Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer. Nanoscale. 2015; 7(15):6712-21. DOI: 10.1039/c4nr07679f. View

4.
Moni P, Al-Obeidi A, Gleason K . Vapor deposition routes to conformal polymer thin films. Beilstein J Nanotechnol. 2017; 8:723-735. PMC: 5389201. DOI: 10.3762/bjnano.8.76. View

5.
Huang S, Wu K . Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory. Risk Anal. 2019; 39(12):2625-2639. DOI: 10.1111/risa.13366. View