Direct Growth of Polycrystalline GaN Porous Layer with Rich Nitrogen Vacancies: Application to Catalyst-Free Electrochemical Detection

It has been demonstrated that defect engineering is an effective strategy to enhance the activity of materials. Herein, a polycrystalline GaN porous layer (PGP) with high catalytic activity was grown by self-assembly on GaN-coated sapphire substrate by using low-temperature (LT) MOCVD growth. Without doping, LT growth can significantly improve the activity and electrical conductivity of PGP, owing to the presence of rich N-vacancies (∼10 cm). Identification of rich N-vacancies in the PGP material was realized by using atomically resolved STEM (AR-STEM) characterization. The optimized PGP was applied to catalyst-free electrochemical detection of HO with a limit of detection (LOD) of 50 nM, a fast response speed of 3 s, a wide linear detection range (50 nM to 12 mM), and a high stability. The LOD is exceeding 40 fold lower than that of reported metal-catalyst decorated GaN. Moreover, a quantitative relationship between the sensing performances and N-vacancy of PGP was established. To our knowledge, it is the first time that intrinsic GaN materials can exhibit high catalytic activity.