Ultra-Broadband, Lithography-Free, and Large-Scale Compatible Perfect Absorbers: The Optimum Choice of Metal Layers in Metal-Insulator Multilayer Stacks

We report ultra-broadband perfect absorbers for visible and near-infrared applications that are based on multilayers of metal-insulator (MI) stacks fabricated employing straightforward layer deposition techniques and are, therefore, lithography-free and large-scale compatible. We scrutinize the impact of different physical parameters of an MIMI absorber structure with analysis of each contributing metal layer. After obtaining the optimal design parameters (i.e. material selection and their thicknesses) with both simulation and numerical analysis (Transfer Matrix Method) methods, an experimental sample is fabricated and characterized. Our fabricated MIMI absorber consists of an optically thick tungsten (W) back reflector layer followed by 80 nm aluminum oxide (AlO), 10 nm titanium (Ti), and finally another 80 nm AlO. The experimental results demonstrate over 90 percent absorption between 400 nm and 1640 nm wavelengths that is optimized for ultra-broadband absorption in MIMI structures. Moreover, the impedance matching method with free-space is used to shed light on the metallic layer selection process.