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Rapid Photoreflectance Spectroscopy for Strained Silicon Metrology

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Journal Rev Sci Instrum
Date 2008 Dec 3
PMID 19044701
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Abstract

We present an improved photoreflectance (PR) spectroscopy technique upon the prior art in providing a rapid acquisition method of the PR spectrum in a simultaneous and multiplexed manner. Rapid PR (RPR) application is the on-line monitoring of strained silicon. Shrinkage in the silicon bandgap is measured and converted to strain, using theoretical models. Experimental RPR results are in good correlation with Raman spectroscopy.